Transreflective type liquid crystal display and method of manufacturing the same

ABSTRACT

Disclosed are a transreflective type LCD and a method of manufacturing the same. A color filter substrate is formed with a light transreflective member for reflecting an external light or transmitting an artificial light and a visual angle increasing member for increasing the visual angle of the light from the light transreflective member. A thickness of a color filter varies to obtain a uniformity of the light from the light transreflective member regardless of the transmissive and the reflective modes. The light from the light transreflective member is provided through a TFT substrate to a user as an image.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a liquid crystal display (LCD),and more particularly to a transreflective type LCD and a method ofmanufacturing the same for increasing an available efficiency of a lightand a color reproducibility of an image.

[0003] 2. Description of the Related Art

[0004] In the so-called information society of these days, electronicdisplay devices are important as information transmission media andvarious electronic display devices are widely applied to industrialapparatus or home appliances. Recently, demand has increased for a newelectronic display devices such as an LCD having characteristics such asthin thickness, light weight, low driving voltage and low powerconsumption. Manufacturing of an LCD has been improved due to advancesin semiconductor technology.

[0005] The LCD is classified as a transmissive type LCD that displays animage using a first light provided from an external, a reflective typeLCD that displays an image using a second light generated by a lightgenerating means installed therein, and a transreflective type LCD thatdisplays the image using either the first light or the second light. Thetransreflective type LCD displays an image using the first light in acase where an amount of the first light is enough to display the imageand displays the image using the second light generated by consumingelectricity charged into itself where the amount of the first light isnot enough to display the image. Thus, the transreflective type LCDreflects the first light and transmits the second light.

[0006]FIG. 1 is a cross-sectional view showing an internal structure ofan LCD panel of a conventional transreflective type LCD.

[0007] Referring to FIG. 1, the transreflective type LCD 100 includes acolor filter substrate 110, a liquid crystal 120 and a TFT (thin filmtransistor) substrate 130. The TFT substrate 130 includes a transparentsubstrate 131, a TFT 132, an organic insulating layer 133, a transparentelectrode 134, a reflective electrode 135 and an alignment layer 136having an alignment groove 136 a.

[0008] The TFT 132 is disposed on the transparent substrate 131 in amatrix shape. The TFT 132 outputs a data signal from an external inresponse to a timing signal. The organic insulating layer 133 isdisposed over the transparent substrate 131 to cover the TFT 132. Theorganic insulating layer 133 has an uneven surface 133 a and a contacthole 133 b to expose an output terminal of the TFT 132. The transparentelectrode 134 is formed by forming an ITO (Indium Thin Oxide) thin filmlayer over the organic insulating layer 133 and patterning the ITO thinfilm layer to be connected with the output terminal of the TFT 132. Thereflective electrode 135 is disposed on the transparent electrode 134.The reflective electrode 135 has an opening 135 a and a portion of thetransparent electrode 134 is exposed through the opening 135 a. Thealignment layer 136 is disposed over the transparent substrate 131 tocover the reflective electrode 135 and the alignment groove 136 a isformed on the alignment layer 136.

[0009] The color filter substrate 110 includes a transparent substrate111, a black matrix 112, a color filter 113, a common electrode 114 andan alignment layer 115. The black matrix 112 disposed on the transparentsubstrate 111 has a lattice shape and faces an insulating space 135 cdisposed adjacent to the reflective electrode 135 of the TFT substrate130. The transparent substrate 111 includes the color filter 113 in amatrix shape corresponding to the reflective electrode 135. The colorfilter 113 includes a red color filter for emitting a monochromaticlight having a red wavelength, a green color filter for emitting amonochromatic light having a green wavelength and a blue color filterfor emitting a monochromatic light having a blue wavelength by filteringthe light.

[0010] The common electrode 114 is disposed over the transparentsubstrate 111 to cover an upper surface of the color filter 113. Thealignment layer 115 is disposed on the transparent substrate 111 tocover the common electrode 114 and the alignment groove 115 a is formedon the alignment layer 115. The color filter substrate 110 is combinedto the TFT substrate 130. The liquid crystal 120 is injected between thecolor filter substrate 110 and the TFT substrate 130.

[0011] Where the amount of the light is not enough to display the image,the transreflective type LCD supplies a light having a first directionfrom the TFT substrate 130 toward the color filter substrate 110 byconsuming an electric energy charged therein. In this transmissive mode,the light having the first direction is supplied to a user 140 throughthe opening 135 a, the liquid crystal 120, the color filter 113 and thetransparent substrate 111. Where an amount of the first light is enoughto display the image, the transreflective type LCD receives a lighthaving a second direction from an external and a lamp (not shown) isturned off. In this reflective mode, the transreflective type LCDreceives the light having the second direction through the transparentsubstrate 111, the color filter 113, the liquid crystal 120 and thereflective electrode 135 and the light incident into the transreflectivetype LCD is supplied to the user 140 through the liquid crystal 120, thecolor filter 113 and the transparent substrate 111.

[0012] The light (hereinafter, referred to as an artificial light) fromthe color filter 113 in the transmissive mode has a different color toneand an impression of the color from those of the light (hereinafter,referred to as a natural light) from the color filter 113 in thereflective mode. This is because a light path inside the LCD isdifferent according to the light source. The natural light passesthrough the color filter 113 twice in the reflective mode and theartificial light passes through the color filter 113 only once in thetransmissive mode. That is, the length through which the natural lightpasses is about twice greater than the length through which theartificial light passes. The differences according to the display modebetween the transmissive mode and the reflective mode result in adeterioration of the image.

[0013] Further, it is difficult to maintain a shape of the unevensurface 133 a of the organic layer 133 due to thin film layers disposedunder the organic layer 133. The uniformity of the light is notdesirably maintained in the transreflective LCD, so that display andvisual properties are deteriorated.

BRIEF SUMMARY OF THE INVENTION

[0014] The present invention provides a transreflective type LCD forincreasing an available efficiency of a light and a colorreproducibility of an image.

[0015] The present invention provides a method of manufacturing atransreflective type LCD for increasing an available efficiency of alight and a color reproducibility of an image.

[0016] In one aspect of the invention, a transreflective type LCDcomprises: a first substrate including a first transparent substrate, apower supply means for supplying a power voltage to the firsttransparent substrate and a first transparent electrode for receivingthe power voltage from the power supply means; a second substrateincluding a second transparent substrate having a visual angle improvingmeans and facing to the first transparent substrate, a lighttransreflective means for transmitting a first light supplied from thesecond transparent substrate to the first transparent substrate andreflecting a second light supplied from the first transparent substrateto the second transparent substrate in a direction of the first light, acolor filter disposed on the transreflective means and a secondelectrode disposed over the color filter; and a liquid crystalinterposed between the first substrate and the second substrate.

[0017] In another aspect, a method of manufacturing a transreflectivetype LCD comprises: fabricating a first substrate by forming a powersupply unit for supplying a power voltage and a first transparentelectrode connected with the power supply unit on a first transparentsubstrate; fabricating a second substrate by forming a lighttransreflective means for transmitting a first light supplied from thesecond transparent substrate to the first transparent substrate andreflecting a second light supplied from the first transparent substrateto the second transparent substrate, forming a color filter on thetransreflective means and forming a second electrode over the colorfilter; combining the first substrate to the second substrate; andinterposing a liquid crystal between the first and the secondsubstrates.

BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above and other advantages of the present invention willbecome readily apparent by reference to the following detaileddescription and the accompanying drawings wherein:

[0019]FIG. 1 is a cross-sectional view showing an internal structure ofan LCD panel of a conventional transreflective type LCD;

[0020]FIG. 2 is a schematic view showing a transreflective type LCDaccording to one embodiment of the present invention;

[0021]FIG. 3 is a cross-sectional view showing a structure of atransreflective type LCD according to one embodiment of the presentinvention;

[0022]FIG. 4 is a plan view of the transreflective type LCD shown inFIG. 3;

[0023]FIG. 5 is a circuit diagram showing a power supply unit and afirst electrode shown in FIG. 4;

[0024]FIG. 6 is a cross-sectional view taken along the line of A-A forshowing a structure of the transreflective type LCD shown in FIG. 4;

[0025]FIG. 7 is a cross-sectional view taken along the line of B-B forshowing a structure of the transreflective type LCD shown in FIG. 4;

[0026]FIG. 8 is a partially enlarged view showing a structure of a lighttransreflective member shown in FIG. 3;

[0027]FIG. 9 is a plan view showing a structure of a color filtersubstrate of the transreflective member shown in FIG. 3;

[0028]FIG. 10 is a cross-sectional view taken along the line of A-A forshowing a structure of the color filter substrate shown in FIG. 9;

[0029]FIG. 11 is a cross-sectional view taken along the line of B-B forshowing a structure of the color filter substrate shown in FIG. 9;

[0030]FIGS. 12A to 12I are cross-sectional views for illustrating amethod of manufacturing a TFT substrate of the transreflective type LCDaccording to one embodiment of the present invention; and

[0031]FIGS. 13A to 13K are cross-sectional views for illustrating amethod of manufacturing a color filter substrate of the transreflectivetype LCD according to one embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0032]FIG. 2 is a schematic view showing a transreflective type LCDaccording to one exemplary embodiment of the present invention. FIG. 3is a cross-sectional view showing a structure of a transreflective typeLCD according to one exemplary embodiment of the present invention. FIG.4 is a plan view of the transreflective type LCD shown in FIG. 3. FIG. 5is a circuit diagram showing a power supply unit and a first electrodeshown in FIG. 4.

[0033] Referring to FIG. 2, an LCD panel 700 of the transreflective typeLCD 800 includes a first substrate 200, a second substrate 300 and aliquid crystal 400.

[0034] Referring to FIGS. 3 to 5, the first substrate 200 includes afirst transparent substrate 210, a power supply unit 220, an organicinsulating layer 230, a first electrode 240 and an alignment layer 280having an alignment groove 285. The first transparent substrate 210 ismade of a glass substrate. The power supply unit 220 disposed on thefirst transparent substrate 210 includes a TFT 226 and a signal line229. The TFT 226 includes a gate electrode 221, a channel layer 222, asource electrode 223 and a drain electrode 224.

[0035]FIG. 6 is a cross-sectional view taken along the line of A-A forshowing a structure of the transreflective type LCD shown in FIG. 4.FIG. 7 is a cross-sectional view taken along the line of B-B for showinga structure of the transreflective type LCD shown in FIG. 4. FIG. 8 is apartially enlarged view showing a structure of a light transreflectivemember shown in FIG. 3.

[0036] Referring to FIG. 6, the gate electrode 221 is formed on an uppersurface of the first transparent substrate 210 to have a first area. Thegate electrode 221 includes a first metal layer 221 a having a firstlight reflectance and a second metal layer 221 b having a second lightreflectance higher than the first light reflectance and disposed on thefirst metal layer 221 a. The first and the second metal layers 221 a and221 b are made of a chrome oxide (CrO2) and a chrome (Cr) films,respectively. The gate electrode 221 having two metal layers such as thefirst and the second metal layers 221 a and 221 b prevents a lighttoward the first metal layer 221 a from being supplied to a user afterbeing reflected from the first metal layer 221 a. The second metal layer221 b of the gate electrode 221 is connected with a gate line 228 of thesignal line 229. The gate line 228 is made of a transparent conductivematerial such as an ITO (Indium Tin Oxide) or an IZO (Indium ZincOxide).

[0037] As shown in FIG. 6, the channel layer 222 is disposed on the gateelectrode 221 and an insulating layer 221 c is disposed between thechannel layer 222 and the gate electrode 221. The channel layer 222 hasa second area smaller than the first area of the gate electrode 221 toprevent an abnormal operation of the power supply unit 220, which may becaused by exposing the channel layer 222 to the light. The channel layer222 employs an amorphous silicon thin film layer or an n⁺ amorphoussilicon thin film layer doped by n⁺ ions.

[0038] Referring to FIGS. 5 and 6, the source and the drain electrodes223 and 224 are disposed on the channel layer 222 and insulated fromeach other. The source electrode 223 is connected with a data line 227of the signal line 229. The data line 227 is formed by patterning atransparent thin film layer made of the ITO or the IZO. The organicinsulating layer 230 is disposed on the power supply unit 220. Theorganic insulating layer 230 has a contact hole to expose a portion ofthe drain electrode 224 of the TFT 226. The first electrode 240 isconnected with the drain electrode 224 of the TFT 226 through thecontact hole 235. The first electrode 240 is formed by patterning atransparent thin film layer made of the ITO or the IZO.

[0039] Returning to FIG. 3, the second substrate 300 includes a secondtransparent substrate 310, a light transreflective member 340, a colorfilter 350 and a second electrode 360. Referring to FIG. 8, the secondtransparent substrate 310 has a projection 315 for improving a visualangle. The projection 315 can be formed by forming an organic insulatinglayer on the second transparent substrate 310, exposing the organicinsulating layer and developing the exposed organic insulating layer.

[0040] As shown in FIGS. 3 and 8, the light transreflective member 340is formed on the second transparent substrate 310 to cover theprojection 315, so that the light transreflective member 340 has anuneven shape identical to a shape of the projection 315. The lighttransreflective member 340 includes a light transreflective thin film320 for transmitting or reflecting the light and a light reflective thinfilm 330 for only reflecting the light. The light transreflective thinfilm 320 is made of aluminum or an aluminum alloy including at least onemetal selected from the group consisting of neodymium (Nd), silicon(Si), copper (Cu), zinc (Zn), titanium (Ti), vanadium (V), cobalt (Co),nickel (Ni), tin (Sn), silver (Ag), palladium (Pd), molybdenum (Mo),zirconium (Zr), tantalum (Ta), tungsten (W) and gold (Au). The lighttransreflective thin film 320 has a thickness to ensure that a lightreflectance is about 30% to about 50% and a transmissivity is about 50%to about 90%, with respect to an total amount of the light. For example,the light transreflective thin film 320 has a thickness of about 20 Å toabout 800 Å and is made of an aluminum-neodymium (Al—Nd) alloy.

[0041] The light reflective thin film 330 is disposed on the lighttransreflective thin film 320. The light reflective thin film 330 has athickness of about 5000 Å and is formed of silver or a silver alloy. Asshown in FIGS. 9 and 10, the light reflective thin film 330 includes anopening 335 to expose a portion of the light transreflective thin film320.

[0042] Where an external area of the light transreflective member 340 islighter than an inner area thereof, a first light 391 supplied from anexternal reaches to the light reflective thin film 330 and the exposedportion of the light transreflective member 320. That is, the firstlight 391 is reflected from the light reflective thin film 330 and theexposed portion of the light transreflective member 320. Thus, the lightutilizing efficiency of the external light increases by reflecting thefirst light using the portion of the light transreflective member 320.

[0043] Where the external area of the light transreflective member 340is darker than the inner area thereof, an operation for displaying animage is substantially impossible because an amount of the light passingthrough the liquid crystal is not enough to display the image. In thiscase, a lamp (not shown) is turned on to generate a second light 392from the internal area toward the external area. The second light 392 issupplied to the liquid crystal passing through a portion of the lighttransreflective member 320, which is not covered by the light reflectivethin film 330.

[0044] The light transreflective member 340 includes a light absorbinglayer 370 formed at a position that correspond to non-effective displayportion 242. The non-effective display portion 242 represents a portionwhere the first electrode 240 is not formed in the layout of the pixel.The liquid crystal 400 disposed in the region corresponding tonon-effective display portions 242 cannot be electrically controlled.The light absorbing layer portion 370 absorbs the light passing throughthe portions adjacent to the first electrode 240. The light absorbinglayer 370 may be formed by partially oxidizing the light reflective thinlayer 330 using an ozone (O₃) or a chemical. Where the light reflectivethin layer is formed of silver, the light absorbing layer 370 is asilver oxide layer.

[0045]FIG. 9 is a plan view showing a structure of a color filtersubstrate of the transreflective member shown in FIG. 3. FIG. 10 is across-sectional view taken along the line of A-A′ for showing astructure of the color filter substrate shown in FIG. 9. FIG. 11 is across-sectional view taken along the line of B-B for showing a structureof the color filter substrate shown in FIG. 9.

[0046] The color filter 350 is disposed in a matrix shape on the secondtransparent substrate 310 having the light transreflective member 340and the light absorbing layer 370. That is, a plurality of color filtersis disposed on the second transparent substrate 310 in the matrix shapeand a plurality of first electrodes are disposed on the first substrate200 corresponding to the plurality of color filters, respectively. Thecolor filter 350 corresponding to one first electrode 240 may have avarious thickness to increase color reproducibility and a compound coloraccording to display modes.

[0047] As shown in FIG. 9, the color filter 350 includes a red colorfilter 353, a green color filter 356 and a blue color filter 359. Thered color filter emits a monochromatic light having a red wavelength,the green color filter emits a monochromatic light having a greenwavelength and the blue color filter emits a monochromatic light havinga blue wavelength by filtering the light.

[0048] Referring to FIG.11, the green color filter 356 includes a firstregion 356 a having a first thickness, a second region 356 b having asecond thickness thinner than the first thickness and a third region 356c having a third thickness thinner than the second thickness. The firstregion 356 a is disposed on the opening 335 of the light reflective thinfilm 330 and the second and third regions 356 b and 356 c are separatedapart from the opening 335 of the light reflective thin film 330. Thethird region 356 c is disposed on a portion on which the color filter350 is not formed. The color filter 350 having three portions, whichhave a different thickness from each other, decreases a difference inthe color reproducibility between the reflective and transmissive modes.

[0049] As shown in FIG. 11, a light 393 supplied from the external areato the internal area sequentially passes through the first substrate200, the liquid crystal 400 and the second region 356 b having thesecond thickness. The light 393 reflected by the light transreflectivethin film 320 passes through the second region 356 b and is supplied tothe liquid crystal 400. That is, a length of the path of the light 393in the LCD is twice the second thickness.

[0050] A light 394 supplied from the internal area to the external areapasses through the first region 356 a having the first thickness and issupplied to the liquid crystal 400. The light 394 passes through thefirst substrate 200 and is supplied to the user. Since the firstthickness is twice the second thickness, the light passing through thefirst region 356 a of the color filter 350 has optical propertiessimilar to those of the light passing through the second region 356 b ofthe color filter 350.

[0051] Since the color filter 350 is not formed in the third region 356c, a portion of the light supplied from the external area to theinternal area is reflected by the light reflective thin film 330. Thelight reflected from the third region 356 c is a white light, so thatthe white light is mixed with the light reflected from the first andsecond regions 356 a and 356 b.

[0052]FIGS. 12A to 12I are cross-sectional views for illustrating amethod of manufacturing a TFT substrate of the transreflective type LCDaccording to one exemplary embodiment of the present invention.

[0053] Referring to FIGS. 12A and 12C, a first metal layer 221 e havinga first light reflectance and a second metal layer 221 d having a secondlight reflectance higher than the first light reflectance aresequentially formed on the first transparent substrate 210. The firstand the second metal layers 221 e and 221 d are made of a chrome oxide(CrO₂) and a chrome (Cr) film, respectively. The first and second metallayers 221 e and 221 d are patterned to form the gate electrode 221 asshown in FIG. 12C. The first metal layer 221 e controls reflection ofthe light incident from the external.

[0054] Referring to FIG. 12D, the transparent conductive material suchas the ITO or the IZO is deposited on the first transparent substrate210 to form a transparent conductive thin film layer 128 a. Thetransparent conductive thin film layer 128 a is patterned to form atransparent gate line 228 for connecting each of gate electrodesarranged in a same column to each other as shown in FIG. 4.

[0055] Referring to FIGS. 12E to 12I, the insulating layer 221 c isformed over the first transparent substrate 210. The amorphous siliconthin film layer (not shown) and the n₊ amorphous silicon thin film layer(not shown) doped by n⁺ ions are sequentially formed as shown in FIG.12F. The amorphous silicon thin film layer and the n⁺ amorphous siliconthin film layer doped by n⁺ ions are patterned to form the channel layer222.

[0056] The source/drain metal thin layer (not shown) is formed over thefirst transparent substrate 210 to cover the channel layer 222. Thesource/drain metal thin layer is patterned to form the source electrode223 and the drain electrode 224 with the data line 227 as shown in FIG.4. The data line 227 may be formed using the ITO or IZO through aseparate process. The data line 227 is commonly connected with each ofTFTs arranged in a same row among the TFTs arranged in the matrix shape.

[0057] As shown in FIG. 12G, the organic insulating layer 230 is formedover the first transparent substrate 210 to cover the source and drainelectrodes 223 and 224. The organic insulating layer 230 has a flatsurface. The contact hole 235 is formed through the organic insulatinglayer 230 to expose the drain electrode 224 as shown in FIG. 12H. Thetransparent conductive thin film layer (not shown) is formed over theorganic insulating layer 230 and patterned to form the first electrode240. The alignment layer 280 is formed on the first transparentsubstrate 210 to cover the first electrode 240 and the alignment groove285 is formed on the alignment layer 280 as shown in FIG. 12I.

[0058]FIGS. 13A to 13K are cross-sectional views for illustrating amethod of manufacturing a color filter substrate of the transreflectivetype LCD according to one exemplary embodiment of the present invention.

[0059] Referring to FIG. 13A, the second transparent substrate 310 hasthe projection 315 for increasing the visual angle. The projection 315may be formed on the second transparent substrate 310 while forming thesecond transparent substrate 310. For example, a surface of the secondtransparent may be treated to have a projection and a recession.

[0060] As shown in FIG. 13B, the projection 315 may be formed through aseparate process. That is, the organic insulating layer 317 and aphotoresist layer are sequentially formed on the second transparentsubstrate 310. The photoresist layer is patterned to form a photoresistpattern by exposing and developing. When etching the organic insulatinglayer 317 using the photoresist pattern as an etching mask, theprojection 317 a is formed on the organic insulating layer 317.

[0061] Referring to FIG. 13C, the light transreflective thin film 320and the light reflective thin film 330 are sequentially formed on theprojection 315. Particularly, the light transreflective thin film 320 isformed to have the thickness of about 20 Å to about 800 Å , e.g., usingan aluminum-neodymium (Al—Nd) alloy. On the light transreflective thinfilm 320, a light reflective thin film layer 332 is formed to have athickness of about 5000 Å , e.g., using silver or a silver alloy.

[0062] Referring to FIG. 13D, a photoresist layer 331 is formed over thelight reflective thin film layer 332 and a negative type photoresistlayer is provided as the photoresist layer 331. A pattern mask 344 isaligned on the photoresist layer 331 and the pattern mask 344 provides alight having a various amount depending on a position of the photoresistlayer 331 to the photoresist layer 331. A portion of the photoresistlayer 331 is completely exposed to form a light transmissive window anda portion of the photoresist layer 331 is partially exposed to form alight absorbing window as shown in FIG. 13D.

[0063] Referring to FIGS. 13E and 13F, the photoresist layer 331 isetched by an etch-back process, so that the light reflective thin filmlayer 332 to form the opening 335. Hereinafter, the light reflectivethin film layer 332 having the opening 335 is called the lightreflective thin film 330. The portion of the light transreflective thinfilm 320 disposed under the light reflective thin film 330 is exposedthrough the opening 335 of the light reflective thin film 330. Theportion on which the light absorbing layer is formed is exposed byetching the photoresist layer 331 using the etch-back process as shownin FIG. 13F.

[0064] As shown in FIG. 13G, the silver oxide layer used as the lightabsorbing layer 370 is formed on the exposed portion of the lightreflective thin film 330. The light reflective thin film 330 isoxidized, e.g., using the ozone (O₃) or the chemical that selectivelyoxidizes silver (Ag). After stripping the photoresist layer 331, thecolor filter 350 is formed on the second transparent substrate 310. Thecolor filter 350 includes the red color filter, the green color filterand the blue color filter.

[0065] Referring to FIGS. 13H to 13J, a red color filter thin film layer353 a having a first height “h1” is formed over the second transparentsubstrate 310 using a red color filter material. The red color filtermaterial emits the monochromatic light having the red wavelength, thered color filter material is made of a photosensitive material,particularly, a negative-type photosensitive material. A pattern mask353 b is disposed on the red color filter thin film layer 353 a as shownin FIG. 13l. An amount of the light passing through a portion of thepattern mask 353 b corresponding to the region “A” on which the lighttransmissive window is formed is smaller than an amount of the lightpassing through a portion of the pattern mask 353 b corresponding to theregion “B” shown in FIG. 9. The amount of the light passing through theportion of the pattern mask 353 b corresponding to the region “B” issmaller than an amount of the light passing through a portion of thepattern mask 353 b corresponding to the region “C” shown in FIG. 9.

[0066] The red color filter thin film layer 353 b is patterned to formthe red color filter 353. The red color filter 353 has the firstthickness “h1” in the portion corresponding to the region “A” and thesecond thickness “h2” in the portion corresponding to the region “B”,which is thinner than the first thickness “h1”. In the region “C”, thereis no red color filter, thus a portion of the light reflective thin film330 is exposed. The green color filter and the blue color filter areformed through processes identical to processes applied to form the redcolor filter 353 as shown in FIG. 13K.

[0067] An over coating thin film 355 is formed on the color filter 350and the second electrode 360 is formed on the over coating thin film355. The second electrode 360 is made of a transparent conductivematerial such as the ITO or the IZO.

[0068] According to the transreflective type LCD and method ofmanufacturing the same, it is able to easily form a projection forincreasing the visual angle and the uniformity of the brightness. Also,it is able to decrease the difference of the image between thetransmissive and the reflective modes.

[0069] Although the exemplary embodiments of the present invention havebeen described, it is understood that the present invention should notbe limited to these exemplary embodiments but various changes andmodifications can be made by one ordinary skilled in the art within thespirit and scope of the present invention as hereinafter claimed.

What is claimed is:
 1. A transreflective type LCD comprising: a firstsubstrate including a first transparent substrate, a power supply meansfor supplying a power voltage to the first transparent substrate and afirst transparent electrode for receiving the power voltage from thepower supply means; a second substrate including a second transparentsubstrate having a visual angle improving means and facing the firsttransparent substrate, a light transreflective means for transmitting afirst light supplied from the second transparent substrate to the firsttransparent substrate and reflecting a second light supplied from thefirst transparent substrate to the second transparent substrate in adirection of the first light, a color filter disposed on thetransreflective means and a second electrode disposed over the colorfilter; and a liquid crystal interposed between the first substrate andthe second substrate.
 2. The LCD of claim 1, wherein the visual angleimproving means has an uneven surface.
 3. The LCD of claim 1, whereinthe visual angle improving means comprises an organic insulating layerhaving an uneven surface.
 4. The LCD of claim 1, wherein the lighttransreflective means comprises a light transreflective thin film forreflecting the second light when the first transparent substrate islighter than the second transparent substrate and for transmitting thefirst light when the second transparent substrate is lighter than thefirst transparent substrate.
 5. The LCD of claim 4, wherein the lighttransreflective thin film has a thickness of about 20 Å to about 800 Å.6. The LCD of claim 1, wherein the light transreflective meanscomprises: a light transreflective thin film for reflecting the secondlight when the first transparent substrate is lighter than the secondtransparent substrate and for transmitting the first light when thesecond transparent substrate is lighter than the first transparentsubstrate; and a light reflective thin film having an opening topartially expose a portion of the light transreflective thin film, forreflecting the second light.
 7. The LCD of claim 6, wherein the lighttransreflective thin film has a thickness of about 20 Å to about 800 Å.8. The LCD of claim 6, further comprising a light absorbing meansdisposed at a portion on the light reflective thin film, the portioncorresponding to a non-effective display portion on the first substratewhere the first electrode is not formed.
 9. The LCD of claim 8, whereinthe light absorbing means includes an oxide layer formed by oxidizingthe light reflective thin film.
 10. The LCD of claim 6, wherein thecolor filter comprises a first area having a first thickness, a secondarea having a second thickness thinner than that of the first thicknessand a third area having a third thickness thinner than that of thesecond thickness, the first area being disposed on the opening and thesecond and third area being disposed on the light reflective thin filmother than the opening.
 11. The LCD of claim 10, wherein the third areaexposes a portion of the light reflective thin film.
 12. The LCD ofclaim 1, wherein the power supply means comprises: a thin filmtransistor disposed on the first transparent substrate in a matrixshape; and a signal line having gate and data lines for driving the thinfilm transistor, wherein the thin film transistor is disposed on thefirst transparent substrate, has a first area, and comprises a gateelectrode including a first metal layer having a first light reflectanceand a second metal layer having a second light reflectance higher thanthat of the first light reflectance, a channel layer having a secondarea smaller than the first area and being insulated from the gateelectrode, a source electrode and a drain electrode being insulated fromthe channel layer and the gate line is connected with the gate electrodeand made of a transparent conductive material.
 13. The LCD of claim 12,wherein the first metal layer is a chrome oxide layer and the secondmetal layer is a chrome thin film layer.
 14. The LCD of claim 1, furthercomprising a light supplying means disposed under the second substrate,for supplying the second light to the second substrate.
 15. A method ofmanufacturing a transreflective type LCD, comprising: fabricating afirst substrate by forming a power supply unit for supplying a powervoltage and a first transparent electrode connected with the powersupply unit on a first transparent substrate; fabricating a secondsubstrate by forming a light transreflective means for transmitting afirst light supplied from the second transparent substrate to the firsttransparent substrate and reflecting a second light supplied from thefirst transparent substrate to the second transparent substrate, forminga color filter on the transreflective means and forming a secondelectrode over the color filter; combining the first substrate to thesecond substrate; and interposing a liquid crystal between the first andthe second substrates.
 16. The method of claim 15, further comprisingforming a visual angle improving means on the second transparentsubstrate before forming the light transreflective means.
 17. The methodof claim 16, wherein the visual angle improving means is formed by asurface treatment of the second transparent substrate to have aprojection and a recession.
 18. The method of claim 16, wherein thevisual angle improving means is formed by: forming an organic insulatinglayer on the second transparent substrate; and forming projected regionsand recessed regions on the organic insulating layer.
 19. The method ofclaim 15, wherein the light transreflective means has a thickness ofabout 20 Å to about 800 Å and is made of aluminum or an aluminum alloy.20. The method of claim 19, wherein the aluminum alloy includes at leastone metal selected from the group consisting of neodymium (Nd), silicon(Si), copper (Cu), zinc (Zn), titanium (Ti), vanadium (V), cobalt (Co),nickel (Ni), tin (Sn), silver (Ag), palladium (Pd), molybdenum (Mo),zirconium (Zr), tantalum (Ta), tungsten (W) and gold (Au).
 21. Themethod of claim 15, wherein the forming of the light transreflectivemeans comprises: forming an aluminum-neodymium alloy thin film layerhaving a thickness of about 20 Å to about 800 Å on the secondtransparent substrate; forming a silver alloy thin film layer on thealuminum-neodymium alloy thin film layer; and forming an opening on aportion of the silver alloy thin film layer to expose thealuminum-neodymium alloy thin film layer.
 22. The method of claim 15,wherein the forming of the color filter comprises: forming a layer of acolor filter material having a photosensitivity on the lighttransreflective means; exposing the color filter material layer to havea first thickness in a region of the opening of the lighttransreflective means, a second thickness smaller than the firstthickness in a first region of the light transreflective means and athird thickness smaller than the second thickness in a second region ofthe light transreflective means, the first and second regions beingdisposed other than the opening; and patterning the color filtermaterial layer to form the color filter.
 23. The method of claim 15,further comprising oxidizing a portion of the light transreflectivemeans corresponding to a non-effective display portion on the firstsubstrate where the first electrode is not formed after forming thelight transreflective means.
 24. The method of claim 15, wherein theforming of the power supply unit comprises: fabricating a thin filmtransistor having a gate electrode, a channel layer, a source electrodeand a drain electrode in a matrix shape; and connecting the gateelectrode of the thin film transistor with an adjacent gate electrodearranged in a same column using a transparent conductive thin filmlayer.